base class, extends NXobject


Container for components to form a controlled electron beam.


No symbol table

Groups cited:

NXaperture_em, NXbeam, NXcorrector_cs, NXlens_em, NXmanufacturer, NXsensor, NXsource, NXstage_lab, NXtransformations


MANUFACTURER: (optional) NXmanufacturer

electron_gun: (optional) NXsource

The source which creates the electron beam.

name: (optional) NX_CHAR

Given name/alias.

voltage: (optional) NX_FLOAT {units=NX_VOLTAGE}

Voltage relevant to compute the energy of the electrons immediately after they left the gun.

probe: (optional) NX_CHAR

Type of radiation.

Obligatory value: electron

emitter_type: (optional) NX_CHAR

Emitter type used to create the beam.

If the emitter type is other, give further details in the description field.

Any of these values:

  • filament

  • schottky

  • cold_cathode_field_emitter

  • other

emitter_material: (optional) NX_CHAR

Material of which the emitter is build, e.g. the filament material.

description: (optional) NX_CHAR

Ideally, a (globally) unique persistent identifier, link, or text to a resource which gives further details.

MANUFACTURER: (optional) NXmanufacturer

TRANSFORMATIONS: (optional) NXtransformations

Affine transformation which detail the arrangement in the microscope relative to the optical axis and beam path.

APERTURE_EM: (optional) NXaperture_em

LENS_EM: (optional) NXlens_em

CORRECTOR_CS: (optional) NXcorrector_cs

STAGE_LAB: (optional) NXstage_lab

SENSOR: (optional) NXsensor

A sensor used to monitor an external or internal condition.

BEAM: (optional) NXbeam

Individual ocharacterization results for the position, shape, and characteristics of the electron beam.

NXtransformations should be used to specify the location of the position at which the beam was probed.

Hypertext Anchors

List of hypertext anchors for all groups, fields, attributes, and links defined in this class.

NXDL Source: